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Trifluoromethyl phenyl diazirine NHS ester

Trifluoromethylphenyldiazirines are one type of the most effective diazirines with generally high photoreaction reaction yield by UV irradiation (~350 nm). Diazirines are known for their ability to undergo photochemical reactions when exposed to ultraviolet (UV) light, specifically by forming highly reactive carbene intermediates that react with nearby molecules. The phenylcarbenes generated by the UV irradiation of trifluoromethylphenyldiazirines have much higher reactivity than nitrenes (generated by phenylazides). Phenylcarbene is incactivated by water when neighboring target molecules are absent, and thus does not lead to non-specific crosslinking. This property makes diazirines useful for studying protein-protein, protein-nucleic acid interactions, ligand-receptor binding, and other biomolecular interactions. It's important to note that diazirines are highly reactive and can be challenging to handle due to their instability. They require careful storage and handling, typically in a controlled environment.

Trifluoromethylphenyldiazirines are one type of the most effective diazirines with generally high photoreaction reaction yield by UV irradiation (~350 nm). Diazirines are known for their ability to undergo photochemical reactions when exposed to ultraviolet (UV) light, specifically by forming highly reactive carbene intermediates that react with nearby molecules.
Trifluoromethylphenyldiazirines are one type of the most effective diazirines with generally high photoreaction reaction yield by UV irradiation (~350 nm). Diazirines are known for their ability to undergo photochemical reactions when exposed to ultraviolet (UV) light, specifically by forming highly reactive carbene intermediates that react with nearby molecules.
CatalogSize
Price
Quantity
390075 mg
Price
 
Physical properties

Molecular weight426.35
SolventDMSO
Storage, safety and handling

H-phraseH303, H313, H333
Hazard symbolXN
Intended useResearch Use Only (RUO)
R-phraseR20, R21, R22
StorageFreeze (< -15 °C); Minimize light exposure
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Page updated on November 20, 2025